Electron Beam Lithography

Raith e-LiNE is an electron beam lithography tool with a 100 mm by 100 mm travel range. It uses thermal field emission filament technology and a laser-interferometer controlled stage. The column voltage varies from 100 eV to 30 keV and the laser stage moves with a precision of 2 nm. There are six apertures on the system: 7.5, 10, 20, 30, 60, and 120 Ám. The electron beam current is controlled by selecting the appropriate aperture. The system is equipped with a load lock. Typically, large area patterns are divided into small writing fields that are stitched together. The individual fields are written one by one by scanning the beam within the field.