The cleanroom facility of the ZMNS was installed in 1994 and operates to class 10,000 (90 m2) and class 100 (130 m2) conditions. The class figures indicate the number of particles smaller than 0.5 microns per cubic foot of air. The air is washed and filtered to guarantee the low number of particles. The temperature is controlled to 23 °C and humidity is kept below 9 g/m3.
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| Atomic Force Microscope |  |
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| Bonder | |
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| Dektak Profilometer | |
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| CVD Reactor | |
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| Electron Beam Lithography | |
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| Ellipsometer | |
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| EV Aligner | |
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| Focused Ion Beam System | |
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| Mask Aligner | |
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| Metalization | |
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| Molecular Beam Epitaxy | |
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| Microscope | |
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| Plasma Enhanced Chemical Vapor Deposition | |
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| Reactive Ion Etching | |
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| Spinner | |
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| Scanning Electron Microscope | |
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| Sputter System | |
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| Rapid Thermal Process System | |
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| Spray Coater | |
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| Wafer Bonder | |
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| X-Ray Diffractometer | |
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